Growth of Epitaxial Anatase TiO2(001) Thin Film on NaCl(001) Substrate by Ion Beam Sputtering and Thermal Annealing

被引：5

作者：

Kao, Chung-Ho ^{[1
]}

Tsai, Jia-Hong ^{[1
]}

Yeh, Sung-Wei ^{[1
]}

Huang, Hsing-Lu ^{[2
]}

Gan, Dershin ^{[1
]}

Shen, Pouyan ^{[1
]}

机构：

[1] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Ctr Nanosci & Nanotechnol, Kaohsiung 80424, Taiwan

[2] ROC Mil Acad, Dept Mech Engn, Kaohsiung 83059, Taiwan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2012年 / 51卷 / 04期

关键词：

TIO2; FILMS; WATER-VAPOR; DEPOSITION; LAALO3; ORIENTATION; DIFFRACTION; SURFACE; FACETS; SRTIO3;

D O I：

10.1143/JJAP.51.045502

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The anatase TiO2(001) surface was shown to have superior photoreactivity. Epitaxial anatase (001) films used to be grown on single-crystal SrTiO3 and LaAlO3 substrates. It is shown in this report that these films can be grown also on the NaCl substrate, which is much cheaper and easily prepared. Epitaxial TiO(001) films were first grown on the NaCl(001) substrate. By testing the TiO-to-anatase transformation over temperature and time ranges, an epitaxial anatase (001) film was prepared by simple thermal oxidation in air. The formation of a single-variant anatase (001) film instead of a multiple-variant film is discussed in this report. (C) 2012 The Japan Society of Applied Physics

引用

页数：4

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