Fast and reliable simulations of argon inductively coupled plasma using COMSOL

被引:64
作者
Brezmes, Angel Ochoa [1 ]
Breitkopf, Cornelia [1 ]
机构
[1] Tech Univ Dresden, Fak Maschinenwesen, Inst Energietech, D-01069 Dresden, Germany
关键词
Inductively coupled plasma; Fluid model; COMSOL; Fast simulations; TEMPERATURE; DISCHARGES; TRANSPORT; EMISSION;
D O I
10.1016/j.vacuum.2015.03.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Inductively coupled plasma (ICP) reactors are widely used for microelectronic device fabrication. Numerical simulations of these devices are an important tool, which enables an improved understanding of ICP processes. Simulations based on fluid models have been reported in literature numerous times; however, in most cases high accuracies require expensive computational costs. We have checked in this work the applicability of COMSOL for plasma simulations, using a fluid model able to provide high accuracies with very low computational cost. A Boltzmann equation solver has been included in order to calculate the electron energy distribution function and the reduced electron mobility. Ions mobility has been calculated as a function of the reduced electric field. The results of the simulations have been benchmarked both against model and experimental results showing a high correlation with experimental values. This model approach can provide, in addition to high accuracy, fast simulations with an easy set-up of initial conditions, which allows flexible changes in the input variables in a short period of time. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:65 / 72
页数:8
相关论文
共 26 条
[1]   Determination of gas temperature and thermometric species in inductively coupled plasmas by emission and diode laser absorption [J].
Bol'shakov, AA ;
Cruden, BA ;
Sharma, SP .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2004, 13 (04) :691-700
[2]   Simulation of inductively coupled plasma with applied bias voltage using COMSOL [J].
Brezmes, Angel Ochoa ;
Breitkopf, Cornelia .
VACUUM, 2014, 109 :52-60
[3]  
Franz G., 2009, Low Pressure Plasmas and Microstructuring Technology
[4]  
Godyak in V, 1997, ELECT KINETICS APPL, P241
[5]   Electron energy distribution function measurements and plasma parameters in inductively coupled argon plasma [J].
Godyak, VA ;
Piejak, RB ;
Alexandrovich, BM .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (04) :525-543
[6]   CONTINUUM MODELING OF RADIOFREQUENCY GLOW-DISCHARGES .1. THEORY AND RESULTS FOR ELECTROPOSITIVE AND ELECTRONEGATIVE GASES [J].
GOGOLIDES, E ;
SAWIN, HH .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) :3971-3987
[7]  
GRAVES DB, 1996, DATABASE NEEDS MODEL
[8]  
Grubert GK, 2005, P COMSOL MULT US C F
[9]   Solving the Boltzmann equation to obtain electron transport coefficients and rate coefficients for fluid models [J].
Hagelaar, GJM ;
Pitchford, LC .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2005, 14 (04) :722-733
[10]   An asymmetrical sensing scheme for 1T1C FRAM to increase the sense margin [J].
Jia Ze ;
Zou Zhongren ;
Ren Tianling ;
Chen Hongyi .
JOURNAL OF SEMICONDUCTORS, 2010, 31 (11) :1150011-1150015