Effect of nitrogen partial pressure on Al-Ti-N films deposited by arc ion plating

被引：69

作者：

Cai, Fei ^{[1
]}

Zhang, Shihong ^{[1
]}

Li, Jinlong ^{[1
]}

Chen, Zhong ^{[1
]}

Li, Mingxi ^{[1
]}

Wang, Lei ^{[1
]}

机构：

[1] Anhui Univ Technol, Sch Mat Sci & Engn, Maanshan City 243002, Anhui, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2011年 / 258卷 / 05期

关键词：

AlTiN film; Macroparticles; Nanoindentation; Adhesion; THIN-FILMS; NANOCOMPOSITE COATINGS; PREFERRED ORIENTATION; MECHANICAL-PROPERTIES; THERMAL-STABILITY; BIAS VOLTAGE; SI-N; HARD; (TI; AL)N; BEHAVIOR;

D O I：

10.1016/j.apsusc.2011.10.053

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

AlTiN films with different nitrogen partial pressures were deposited using arc ion plating (AIP) technique. In this study, we systematically investigated the effect of the nitrogen partial pressure on composition, deposition efficiency, microstructure, macroparticles (MPs), hardness and adhesion strength of the AlTiN films. The results showed that with increasing the nitrogen partial pressure, the deposition rate exhibited a maximum at 1.2 Pa. Results of X-ray photoelectron spectroscopy (XPS) analysis revealed that AlTiN films were comprised of Ti-N and Al-N bonds. XRD results showed that the films exhibited a (1 1 1) preferred growth, and AlTi3N and TiAlx phases were observed in the film deposited at 1.7 Pa. Analysis of MPs statistics showed MPs decreased with the increase in the nitrogen partial pressure. In addition, the film deposited at 1.2 Pa possessed the maximum hardness of 38 GPa and the better adhesion strength. (C) 2011 Elsevier B. V. All rights reserved.

引用

页码：1819 / 1825

页数：7

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