A 20-44 GHz Wideband LNA Design Using the SiGe Technology for 5G Millimeter-Wave Applications

被引:2
|
作者
Balani, Warsha [1 ]
Sarvagya, Mrinal [1 ]
Ali, Tanweer [2 ]
Samasgikar, Ajit [3 ]
Kumar, Pradeep [4 ]
Pathan, Sameena [5 ]
Pai MM, Manohara [5 ]
机构
[1] Reva Univ, Sch Elect & Commun Engn, Bangalore 560064, Karnataka, India
[2] Manipal Acad Higher Educ, Manipal Inst Technol, Dept Elect & Commun Engn, Manipal 576104, India
[3] MMRFIC Technol Pvt Ltd, Bangalore 560064, Karnataka, India
[4] Univ KwaZulu Natal, Discipline Elect Elect & Comp Engn, ZA-4041 Durban, South Africa
[5] Manipal Acad Higher Educ, Manipal Inst Technol, Dept Informat & Commun Technol, Manipal 576104, India
关键词
mm-wave; LNA; SiGe HBT; 5G sub-system; LOW-NOISE AMPLIFIER; RECEIVER;
D O I
10.3390/mi12121520
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
This paper presents the design and implementation of a low-noise amplifier (LNA) for millimeter-wave (mm-Wave) 5G wireless applications. The LNA was based on a common-emitter configuration with cascode amplifier topology using an IHP's 0.13 mu m Silicon Germanium (SiGe) heterojunction bipolar transistor (HBT) whose f_T/f_MAX/gate-delay is 360/450 GHz/2.0 ps, utilizing transmission lines for simultaneous noise and input matching. A noise figure of 3.02-3.4 dB was obtained for the entire wide bandwidth from 20 to 44 GHz. The designed LNA exhibited a gain (S_21) greater than 20 dB across the 20-44 GHz frequency range and dissipated 9.6 mW power from a 1.2 V supply. The input reflection coefficient (S_11) and output reflection coefficient (S_22) were below -10 dB, and reverse isolation (S_12) was below -55 dB for the 20-44 GHz frequency band. The input 1 dB (P1dB) compression point of -18 dBm at 34.5 GHz was obtained. The proposed LNA occupies only a 0.715 mm(2) area, with input and output RF (Radio Frequency) bond pads. To the authors' knowledge, this work evidences the lowest noise figure, lowest power consumption with reasonable highest gain, and highest bandwidth attained so far at this frequency band in any silicon-based technology.
引用
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页数:14
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