Stoichiometric Effect of Sb2Te3 Thin Film on Thermoelectric Property

被引:15
作者
Sun, Zhen-Wei [1 ]
Cheng, Kai-Wen [1 ]
Lin, Si-Wei [1 ]
Ranganayakulu, V. K. [2 ]
Chen, Yang-Yuan [2 ]
Chiu, Shang-Jui [3 ]
Lee, Tai-Wei [3 ]
Wu, Albert T. [1 ]
机构
[1] Natl Cent Univ, Dept Chem & Mat Engn, Taoyuan 32001, Taiwan
[2] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
[3] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
关键词
Sb2Te3; interfacial reaction; defect reaction; power actor Seebeck coefficient; stoichiometric effect; DIFFUSION; ELECTRODEPOSITION; MICROSTRUCTURE;
D O I
10.1021/acsaem.2c00657
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Properly selecting electrode materials for antimony telluride (Sb2Te3) thermoelectric (TE) thin film enhances the power factor. This study analyzed the compositional variation and measured the TE properties of pristine antimony telluride (Sb2Te3), Ni/Sb2Te3/Ni, and Cu/Sb2Te3/Cu thin films that were aged to simulate real applications. The rapid diffusion of Cu in the Cu/Sb2Te3/Cu film resulted in the massive growth of the CuTe intermetallic compound (IMC), which led to Te deficiency. Te deficiency causes the formation of antisite Sb-Te' and reduces the power factor. Antisite Te-sb(.) increases the power factor because the growth of Sb2O3 on the pristine Sb2Te3 and Ni/Sb2Te3/Ni films, in which almost no Ni diffusion occurs, results in Sb deficiency. The formation of oxides and IMCs alters the stoichiometry of the films. The formation of the NiTe reaction layer at the interface becomes a self-barrier that inhibits Ni diffusion to the Sb2Te3 film. Herein, a defect reaction is proposed to explain the effects of such changes on the TE properties and the relationship between the stoichiometry of the films and the concentrations of the antisites.
引用
收藏
页码:7026 / 7033
页数:8
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