Optical and structural properties of ZnO thin films grown on various substrates by metalorganic chemical vapor deposition

被引:13
作者
Kong, Bo Hyun [1 ]
Mohanta, Sanjay Kumar [1 ]
Kim, Dong Chan [1 ]
Cho, Hyung Koun [1 ]
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, Gyeonggi Do, South Korea
关键词
ZnO thin films; MOCVD; various substrates;
D O I
10.1016/j.physb.2007.08.197
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We investigated the optical and structural properties of ZnO thin films grown under the same growth condition by metalorganic chemical vapor deposition (MOCVD) on various substrates such as p-Si, n-GaN, c-sapphire, a-sapphire, glass, and ITO glass. The thickness and surface roughness of the ZnO films increased with increasing lattice mismatch between the film and substrate. The ZnO films on c-sapphire showed a higher carrier concentration and conductivity than the ZnO thin films on a-sapphire and glass. In addition, the intensity of the near band-edge emission and transmittance increased with decreasing lattice mismatch between the film and substrate. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:399 / 403
页数:5
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