Design of freeform lens with TFMG reflector for UV-LEDs lithography system

被引：7

作者：

Pan, C. T. ^{[1
]}

Yang, T. L. ^{[1
]}

Chen, Y. C. ^{[1
]}

Chang, C. M. ^{[2
]}

Hsu, J. H. ^{[2
]}

Huang, J. C. ^{[2
]}

机构：

[1] Natl Sun Yat Sen Univ, Coll Engn, Dept Mech & Electromech Engn, 70 Lienhai Rd, Kaohsiung 80424, Taiwan

[2] Natl Sun Yat Sen Univ, Coll Engn, Dept Mat & Optoelect Sci, Ctr Nanosci & Nanotechnol, 70 Lienhai Rd, Kaohsiung 80424, Taiwan

来源：

OPTIK | 2016年 / 127卷 / 17期

关键词：

Freeform lens; Thin film metallic glasses; Light-emitting diode; Lithography system; 3-D printing; ARRAY;

D O I：

10.1016/j.ijleo.2016.04.110

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A freeform lens with inclined reflector coated with Al-Ni-Y thin film metallic glass (TFMG) was proposed to improve the irradiance and uniformity of an ultraviolet light-emitting diode (UV-LEDs) lithography system. Polydimethylsiloxane (PDMS) was adopted as lens materials. The lens mold was fabricated by 3-D printing method. Besides, a recipe of TFMG with 88% reflectivity was determined to enhance the exposure performance. The results show the average irradiance and uniformity with 60 inclined reflector were 8.7 mW/cm(2) and 82%, respectively. The system with 60 inclined reflector layer can achieve 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement. (C) 2016 Elsevier GmbH. All rights reserved.

引用

页码：6850 / 6857

页数：8

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