Localized electrodeposition using a scanning tunneling microscope tip as a nanoelectrode

被引:42
|
作者
Schindler, W [1 ]
Hofmann, D [1 ]
Kirschner, J [1 ]
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany
关键词
D O I
10.1149/1.1343107
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The mechanism of localized electrodeposition on the nanometer scale is studied using the tip of an electrochemical scanning tunneling microscope as a "nanoelectrode," which is retracted from the substrate (working electrode) during growth of the clusters. The system chosen exemplarily is Au(111)/Co2+, which shows a relatively weak substrate/deposit interaction compared to the strong interaction characteristic of underpotential deposition systems. The width and height of the clusters, which can be grown with diameters even below 10 nm, are determined by the diameter of the tip apex, the distance between tip and substrate, the substrate potential, and by the amount of Co transferred to the substrate via the tip. The influence of these parameters on the cluster growth can be well understood assuming diffusion as the mechanism of Co transfer from the rip to the substrate. Field and charging effects of either tip or substrate can be excluded due to the large distance of approximately 20 nm between both electrodes. (C) 2001 The Electrochemical Society. All rights reserved.
引用
收藏
页码:C124 / C130
页数:7
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