Kirkendall voids and the formation of amorphous phase in the Al-Pt thin-film system prepared by high-temperature successive deposition

被引：29
作者：
Radi, Z
Barna, PB
Labar, J
机构：
[1] Res. Institute for Technical Physics, Hungarian Academy of Sciences, H-1325 Budapest
来源：
JOURNAL OF APPLIED PHYSICS | 1996年 / 79卷 / 08期
关键词：
D O I：
10.1063/1.361772
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We report on the amorphization processes taking place in the Al-Pt thin-film system prepared by high-temperature successive deposition. The formation of Kirkendall voids in the Al film was directly proved and intensively studied in relation to the percentage of Al and Pt components. An estimation of the composition of the amorphous phase is given, and the model proposed for the amorphization process is discussed. The films were analyzed by transmission electron microscopy, cross-sectional transmission electron microscopy, selected area electron diffraction, and energy dispersive x-ray microanalysis. (C) 1996 American Institute of Physics.
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页码：4096 / 4100
页数：5
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