Electrochemical methods to analyse the light-induced plating process

被引：34

作者：

Bartsch, J. ^{[1
]}

Radtke, V. ^{[1
]}

Schetter, C. ^{[1
]}

Glunz, S. W. ^{[1
]}

机构：

[1] Fraunhofer ISE, D-79110 Freiburg, Germany

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 2010年 / 40卷 / 04期

关键词：

Crystalline solar cells; Light-induced plating; Absolute potential measurement; Current density;

D O I：

10.1007/s10800-009-0054-5

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

This study deals with some specific characteristics that the light-induced plating (LIP) process, which is used for the metallisation of solar cells, exhibits compared to classical electroplating processes. We contribute to the general understanding of LIP (multiple electrodes, influence of light) with some basic experiments and propose a simplified equivalent circuit scheme. We also address the challenge of process control through potential and current without external connection of the working electrode (front side grid). In this article, we show a possibility to determine the absolute potential of the front side grid for relevant process parameters. Furthermore, we present a method that allows the measurement of the mean current density at the front side grid during the process, which has a great influence on the plating result.

引用

页码：757 / 765

页数：9