Properties of super-hard carbon films deposited by pulsed arc process

被引：18

作者：

Grimm, Werner ^{[1
]}

Weihnacht, Volker ^{[2
]}

机构：

[1] INOVAP Vakuum & Plasmatech GmbH Dresden, D-01454 Grosserkmannsdorf, Germany

[2] Fraunhofer Inst Werkstoff & Strahltech, D-01277 Dresden, Germany

来源：

VACUUM | 2010年 / 85卷 / 04期

关键词：

DLC; Vacuum arc; Pulsed dc-arc;

D O I：

10.1016/j.vacuum.2010.01.022

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The pulsed vacuum arc discharge (pulsed arc) is the most efficient PVD-technology for the deposition of super-hard carbon films on tools and machinery parts. Using the pulsed arc discharge a stable evaporation process of carbon and an efficient deposition of hydrogen-free ta-C type films is possible. In this paper, important properties of such ta-C films and their process conditions are explained. The films were characterized by hardness measurements using nanoindentation, friction and wear properties using oscillating sliding tests, and structural analysis using Raman spectroscopy. (C) 2010 Published by Elsevier Ltd.

引用

页码：506 / 509

页数：4

共 7 条

[1] Influence of the pulsing of the current of a vacuum arc on rate and droplets [J].

Büschel, M ;

Grimm, W .

SURFACE & COATINGS TECHNOLOGY, 2001, 142 :665-668

[2]

Chudoba T, 2006, NAN SCI TEC, P216

[3] Interpretation of Raman spectra of disordered and amorphous carbon [J].

Ferrari, AC ;

Robertson, J .

PHYSICAL REVIEW B, 2000, 61 (20) :14095-14107

[4] Gas Phase Modification of Superhard Carbon Coatings Deposited by Pulsed DC-Arc-Process [J].

Grimm, Werner ;

Weihnacht, Volker .

PLASMA PROCESSES AND POLYMERS, 2009, 6 :S433-S437

[5] A laser-acoustic method for testing and classifying hard surface layers [J].

Schneider, D ;

Schultrich, B ;

Scheibe, HJ ;

Ziegele, H ;

Griepentrog, M .

THIN SOLID FILMS, 1998, 332 (1-2) :157-163

[6]

*VDI FACH, 2004, KOHL UB SCH EIG, P2840

[7]

*VDI FACH, 2001, QUAL BEI PVD CVD HAR, P3824

← 1 →