Absolute diode laser-based in situ detection of HCl in gasification processes

被引：41

作者：

Ortwein, P. ^{[1
,2
]}

Woiwode, W. ^{[1
]}

Fleck, S. ^{[4
]}

Eberhard, M. ^{[4
]}

Kolb, T. ^{[4
]}

Wagner, S. ^{[1
,3
]}

Gisi, M. ^{[1
]}

Ebert, V. ^{[1
,2
,3
]}

机构：

[1] Heidelberg Univ, Inst Phys Chem, INF 253, D-69120 Heidelberg, Germany

[2] Phys Tech Bundesanstalt, D-38116 Braunschweig, Germany

[3] Tech Univ Darmstadt, Ctr Smart Interfaces, D-64287 Darmstadt, Germany

[4] Karlsruhe Inst Technol, ITC TAB, D-76344 Eggenstein Leopoldshafen, Germany

来源：

EXPERIMENTS IN FLUIDS | 2010年 / 49卷 / 04期

关键词：

SURFACE-EMITTING LASER; MU-M; TEMPERATURE; GAS; CO; ABSORPTION; SENSOR; H2O; PRESSURE;

D O I：

10.1007/s00348-010-0904-2

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The release of HCl is an important parameter for industrial combustion and gasification processes, which must be determined in the ppm range for active process control and optimization. Based on a low power vertical-cavity surface-emitting laser (VCSEL) at 1.74 mu m, we developed a new tuneable diode laser absorption spectrometer for calibration-free, absolute in situ HCl detection using the (HCl)-Cl-35 (2 a dagger 0) R(3) absorption line with minimized cross-sensitivity to CO2 and H2O. The spectrometer was applied to in situ measurements in a gasification process (T = 1,130A degrees C, P = 1 atm, L = 28 cm) and yielded an optical resolution of 2.3 center dot 10(-4), i.e. a HCl sensitivity of 45 ppm (13 ppm center dot m).

引用

页码：961 / 968

页数：8

共 31 条

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