Leakage and trapping characteristics in Au-free AlGaN/GaN Schottky barrier diodes fabricated on C-doped buffer layers

被引:5
作者
Hu, Jie [1 ,2 ]
Stoffels, Steve [2 ]
Lenci, Silvia [2 ]
You, Shuzhen [2 ]
Bakeroot, Benoit [2 ,3 ,4 ]
Ronchi, Nicolo [2 ]
Venegas, Rafael [2 ]
Groeseneken, Guido [1 ,2 ]
Decoutere, Stefaan [2 ]
机构
[1] Katholieke Univ Leuven, Dept Elect Engn ESAT, B-3001 Leuven, Belgium
[2] IMEC VZW, Kapeldreef 75, B-3001 Leuven, Belgium
[3] IMEC, Ctr Microsyst Technol CMST, Technol Pk 15, B-9052 Ghent, Belgium
[4] Univ Ghent, Technol Pk 15, B-9052 Ghent, Belgium
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2016年 / 213卷 / 05期
关键词
buffer layers; charge trapping; current transient spectroscopy; doping; GaN; Schottky diodes;
D O I
10.1002/pssa.201532797
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the DC and dynamic characteristics of AlGaN/GaN Schottky barrier diodes (SBDs) and the diodes with a gated edge termination (GET-SBD) fabricated on unintentional doped (UID) and carbon-doped AlGaN buffers. The off-state characteristics of diodes fabricated on UID buffer are dominated by buffer leakage and buffer breakdown voltage (BV) at higher reverse voltage (V-R larger than 300 V). An improvement in diode leakage and BV can be obtained by fabricating the GET-SBDs on C-doped buffers. A pronounced R-ON degradation of the AlGaN/GaN SBDs and GET-SBDs on carbon-doped buffers was observed by dynamic pulsed I-V characterization. This dynamic R-ON degradation causes a clear forward current reduction for the AlGaN/GaN GET-SBDs. From combined offstate stress and current transient measurements on AlGaN/GaN SBDs, the collapsed current is recoverable and the R-ON degradation is due to a temporary trapping mechanism occurring in the buffer. A distinct trap level of 0.57 eV from trap spectra has been extracted for the diode fabricated on C-doped buffer, and the value was implemented in a TCAD simulator. The simulated results confirm a bulk trapping in the buffer layer for the SBD and show an additional trapping region in the GET-SBD architecture. (C) 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:1229 / 1235
页数:7
相关论文
共 29 条
[1]   Fast-Switching GaN-Based Lateral Power Schottky Barrier Diodes With Low Onset Voltage and Strong Reverse Blocking [J].
Bahat-Treidel, E. ;
Hilt, Oliver ;
Zhytnytska, Rimma ;
Wentzel, Andreas ;
Meliani, Chafik ;
Wuerfl, Joachim ;
Traenkle, Guenther .
IEEE ELECTRON DEVICE LETTERS, 2012, 33 (03) :357-359
[2]   AlGaN/GaN/GaN:C Back-Barrier HFETs With Breakdown Voltage of Over 1 kV and Low RON x A [J].
Bahat-Treidel, Eldad ;
Brunner, Frank ;
Hilt, Oliver ;
Cho, Eunjung ;
Wuerfl, Joachim ;
Traenkle, Guenther .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (11) :3050-3058
[3]   Kinetics of Buffer-Related RON-Increase in GaN-on-Silicon MIS-HEMTs [J].
Bisi, Davide ;
Meneghini, Matteo ;
Marino, Fabio Alessio ;
Marcon, Denis ;
Stoffels, Steve ;
Van Hove, Marleen ;
Decoutere, Stefaan ;
Meneghesso, Gaudenzio ;
Zanoni, Enrico .
IEEE ELECTRON DEVICE LETTERS, 2014, 35 (10) :1004-1006
[4]   Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD [J].
Boyd, Adam R. ;
Degroote, Stefan ;
Leys, Maarten ;
Schulte, Frank ;
Rockenfeller, Olaf ;
Luenenbuerger, Markus ;
Germain, Marianne ;
Kaeppeler, Johannes ;
Heuken, Michael .
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 2, 2009, 6 :S1045-S1048
[5]   AlGaN/GaN/AlGaN Double Heterostructures Grown on 200 mm Silicon (111) Substrates with High Electron Mobility [J].
Cheng, Kai ;
Liang, Hu ;
Van Hove, Marleen ;
Geens, Karen ;
De Jaeger, Brice ;
Srivastava, Puneet ;
Kang, Xuanwu ;
Favia, Paola ;
Bender, Hugo ;
Decoutere, Stefaan ;
Dekoster, Johan ;
Borniquel, Jose Ignacio del Agua ;
Jun, Sung Won ;
Chung, Hua .
APPLIED PHYSICS EXPRESS, 2012, 5 (01)
[6]   Slow Detrapping Transients due to Gate and Drain Bias Stress in High Breakdown Voltage AlGaN/GaN HEMTs [J].
DasGupta, Sandeepan ;
Sun, Min ;
Armstrong, Andrew ;
Kaplar, Robert J. ;
Marinella, Matthew J. ;
Stanley, James B. ;
Atcitty, Stan ;
Palacios, Tomas .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2012, 59 (08) :2115-2122
[7]  
Delaine J, 2012, APPL POWER ELECT CO, P1754, DOI 10.1109/APEC.2012.6166059
[8]   EFFECTS OF OXIDE TRAPS ON MOS CAPACITANCE [J].
HEIMAN, FP ;
WARFIELD, G .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1965, ED12 (04) :167-&
[9]   Analysis of backside-electrode and gate-field-plate effects on buffer-related current collapse in AlGaN/GaN high electron mobility transistors [J].
Horio, Kazushige ;
Onodera, Hiraku ;
Nakajima, Atsushi .
JOURNAL OF APPLIED PHYSICS, 2011, 109 (11)
[10]   Current transient spectroscopy for trapping analysis on Au-free AlGaN/GaN Schottky barrier diode [J].
Hu, J. ;
Stoffels, S. ;
Lenci, S. ;
Bakeroot, B. ;
Venegas, R. ;
Groeseneken, G. ;
Decoutere, S. .
APPLIED PHYSICS LETTERS, 2015, 106 (08)