Growth and Intercalation of Graphene on Silicon Carbide Studied by Low-Energy Electron Microscopy

被引:16
作者
Speck, Florian [1 ,2 ]
Ostler, Markus [1 ,2 ]
Besendoerfer, Sven [1 ]
Krone, Julia [2 ]
Wanke, Martina [1 ,2 ]
Seyller, Thomas [1 ,2 ]
机构
[1] Univ Erlangen Nurnberg, Lehrstuhl Tech Phys, Erwin Rommel Str 1, D-91058 Erlangen, Germany
[2] Tech Univ Chemnitz, Inst Phys, Reichenhainer Str 70, D-09126 Chemnitz, Germany
关键词
Graphene; silicon carbide; low-energy electron microscopy; growth; intercalation; EPITAXIAL-GRAPHENE; MONOLAYER GRAPHENE; BUFFER LAYER; LARGE-AREA; BILAYER GRAPHENE; SIC(0001); GRAPHITE; TRANSISTORS; GRAPHITIZATION; 6H-SIC(0001);
D O I
10.1002/andp.201700046
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Based on its electronic, structural, chemical, and mechanical properties, many potential applications have been proposed for graphene. In order to realize these visions, graphene has to be synthesized, grown, or exfoliated with properties that are determined by the targeted application. Growth of so-called epitaxial graphene on silicon carbide by sublimation of silicon in an argon atmosphere is one particular method that could potentially lead to electronic applications. In this contribution we summarize our recent work on different aspects of epitaxial graphene growth and interface manipulation by intercalation, which was performed by a combination of low-energy electron microscopy, low-energy electron diffraction, atomic force microscopy and photoelectron spectroscopy.
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页数:13
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