TiC and TaC deposition by pulsed laser ablation: a comparative approach

被引：54

作者：

Teghil, R

D'Alessio, L

Zaccagnino, M

Ferro, D

Marotta, V

De Maria, G

机构：

[1] Univ Basilicata, Dipartimento Chim, I-85100 Potenza, Italy

[2] CNR, Ctr Termodinam Chim Alte Tempature, Rome, Italy

[3] CNR, Ist Mat Speciali, Potenza, Italy

[4] Univ Roma La Sapienza, Dipartimento Chim, Rome, Italy

来源：

APPLIED SURFACE SCIENCE | 2001年 / 173卷 / 3-4期

关键词：

pulsed laser ablation; deposition; titanium carbide; tantalum carbide; thin films;

D O I：

10.1016/S0169-4332(00)00900-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Titanium and tantalum monocarbides have been evaporated by means of doubled Nd-YAG laser and deposited on oriented silicon substrates. The gaseous phase and the deposited films have been characterised by mass spectrometry, optical imaging (ICCD camera) and electron microscopy analysis (SEM, TEM), X-ray diffraction, X-ray photoelectron spectroscopy (XPS), respectively. The major differences between the two systems, observed in the gas phase analysis concern the plume composition and morphology which are strictly related to the films characteristics. In fact, while in the case of TiC it is possible to identify several evaporation mechanisms as a function of the laser fluence leading to different film composition, the ablation of TaC can be interpreted mainly in terms of a single process. The steps of the film growth were also studied for both systems. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：233 / 241

页数：9

共 22 条

[1] Pulsed laser deposition of thin films for optical applications [J].

Afonso, CN ;

Gonzalo, J .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 116 (1-4) :404-409

[2]

ASHWINI PK, 1989, J VAC SCI TECHNOL A, V7, P1488

[3]

CHRYSEY DB, 1994, PULSED LASER DEPOSIT

[4] Silicon supported TiC films produced by pulsed laser ablation [J].

D'Alessio, L ;

Salvi, AM ;

Teghil, R ;

Marotta, V ;

Santagata, A ;

Brunetti, B ;

Ferro, D ;

De Maria, G .

APPLIED SURFACE SCIENCE, 1998, 134 (1-4) :53-62

[5]

DEMARIA G, 1984, THERMOCHEMISTRY ITS, P157

[6]

DEMARIA G, 1998, P 5 INT C COMP ENG N, P225

[7] TITANIUM CARBIDE THIN-FILMS OBTAINED BY REACTIVE MAGNETRON SPUTTERING [J].

GEORGIEV, G ;

FESCHIEV, N ;

POPOV, D ;

UZUNOV, Z .

VACUUM, 1986, 36 (10) :595-597

[8] AlN thin film deposition by pulsed laser ablation of Al in NH3 [J].

Guidoni, AG ;

Mele, A ;

DiPalma, TM ;

Flamini, C ;

Orlando, S .

THIN SOLID FILMS, 1997, 295 (1-2) :77-82

[9]

HAMMOND ML, 1978, SOLID STATE TECHNOL, V21, P68

[10]

Krajewski A, 1998, CRYST RES TECHNOL, V33, P341, DOI 10.1002/(SICI)1521-4079(1998)33:3<341::AID-CRAT341>3.0.CO

← 1 2 3 →