Research and development in plasma-based ion implantation in Europe. I. Apparatus and projects

被引：15
作者：
Ensinger, W [1 ]
机构：
[1] Univ Marburg, Dept Chem, D-35032 Marburg, Germany
[2] Univ Marburg, Ctr Mat Sci, D-35032 Marburg, Germany
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 02期
关键词：
D O I：
10.1116/1.590642
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
More than a decade ago the first results on plasma-based ion implantation were presented by groups in the U.S. and Australia in the metallurgical field, and by groups in Japan for semiconductor processing. In the meantime, this technology has found widespread interest and is nearing commercialization. In Europe, the first reports in the literature appeared in the beginning of the 1990s. The present review discusses the research and development in plasma-based ion implantation in Europe, both the historical development and the present status, including the development of apparatus and projects which have been carried out. (C) 1999 American Vacuum Society. [S0734-211X(99)01802-8].
引用
收藏
页码：799 / 807
页数：9
相关论文
共 25 条
[1]   Characterization of Ti-6Al-4V modified by nitrogen plasma immersion ion implantation [J].
Alonso, F ;
Rinner, M ;
Loinaz, A ;
Onate, JI ;
Ensinger, W ;
Rauschenbach, B .
SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3) :305-308
[2]   Influence of process parameters on the nitriding of steels by plasma immersion ion implantation [J].
Blawert, C ;
Mordike, BL ;
Collins, GA ;
Short, KT ;
Tendys, J .
SURFACE & COATINGS TECHNOLOGY, 1998, 104 :240-247
[3]   50-KV PULSE-GENERATOR FOR PLASMA SOURCE ION-IMPLANTATION [J].
BOHM, G ;
GUNZEL, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02) :821-822
[4]   Metal plasma immersion ion implantation and deposition (MPIIID): chromium on magnesium [J].
Bruckner, J ;
Gunzel, R ;
Richter, E ;
Moller, W .
SURFACE & COATINGS TECHNOLOGY, 1998, 104 :227-230
[5]   Sheath dynamics in plasma immersion ion implantation [J].
Brutscher, J ;
Gunzel, R ;
Moller, W .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (01) :54-60
[6]   A 100 kV 10 a high-voltage pulse generator for plasma immersion ion implantation [J].
Brutscher, J .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1996, 67 (07) :2621-2625
[7]   PLASMA IMMERSION ION-IMPLANTATION FOR ULSI PROCESSING [J].
CHEUNG, NW .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 55 (1-4) :811-820
[8]   Characterisation of high voltage pulser performance in radiofrequency plasmas [J].
Collins, GA ;
Short, KT ;
Tendys, J .
SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3) :181-187
[9]   Development of a plasma immersion ion implanter for the surface treatment of metal components [J].
Collins, GA ;
Hutchings, R ;
Short, KT ;
Tendys, J ;
VanDerValk, CH .
SURFACE & COATINGS TECHNOLOGY, 1996, 84 (1-3) :537-543
[10]   Ion-assisted surface modification by plasma immersion ion implantation [J].
Collins, GA ;
Hutchings, R ;
Short, KT ;
Tendys, J .
SURFACE & COATINGS TECHNOLOGY, 1998, 104 :212-217
123