Microstructure and thermoelectric properties of Sn-doped Bi2Te2.7Se0.3 thin films deposited by flash evaporation method

被引:16
作者
Duan, X. K. [1 ]
Jiang, Y. Z. [2 ]
机构
[1] Jiujiang Univ, Sch Mech & Mat Engn, Ctr New Energy Mat Res, Jiujiang 332005, Peoples R China
[2] Jiujiang Univ, Sch Elect Engn, Jiujiang 332005, Peoples R China
关键词
Sn doping; Thin films; Thermoelectric properties; Flash evaporation; CHEMICAL-VAPOR-DEPOSITION; ELECTRICAL-RESISTIVITY; TRANSPORT-PROPERTIES; TEMPERATURE-DEPENDENCE; OPTIMIZATION; THICKNESS; BI2TE3; COEVAPORATION; DEVICES; GROWTH;
D O I
10.1016/j.tsf.2010.11.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
(Bi1-xSnx)(2)Te2.7Se0.3 thermoelectric thin films with thickness of 800 nm have been deposited on glass substrates by flash evaporation method at 473 K. The structures, morphology of the thin films were analyzed by X-ray diffraction and field emission scanning electron microscopy respectively. Effects of Sn-doping concentration on thermoelectric properties of the annealed thin films were investigated by room-temperature measurement of Seebeck coefficient and electrical resistivity. The thermoelectric power factor was enhanced to 12.8 mu W/cmK(2) (x=0.003). From x=0.004 to 0.01 Sn doping concentration, the Seebeck coefficients are positive and show p-type conduction. The Seebeck coefficient and electrical resistivity gradually decrease with increasing Sn doping concentration. Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:3007 / 3010
页数:4
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