Role of Cu in dissolution kinetics of Cu metallization in molten Sn-based solders

被引:91
作者
Huang, ML [1 ]
Loeher, T
Ostmann, A
Reichl, H
机构
[1] Dalian Univ Technol, Dept Mat Sci & Engn, Dalian 116024, Peoples R China
[2] Fraunhofer Inst Reliabil & Microintegrat IZM, Dept Chip Integrat Technol, D-13355 Berlin, Germany
[3] Tech Univ Berlin, D-13355 Berlin, Germany
关键词
D O I
10.1063/1.1925317
中图分类号
O59 [应用物理学];
学科分类号
摘要
The focus of this study is on the role of Cu content in the dissolution kinetics of Cu in high-Sn solders during the solid/liquid reaction accompanied by interfacial intermetallic compound formation. Small additions of Cu (0.7%, 1.5%) in high-Sn solders dramatically decrease the dissolution rate of Cu at low temperatures. Sn-3.5Ag, as expected, has a dissolution rate similar to that of pure Sri. The difference in dissolution rate of Cu in various molten solders is explained in terms of the solubility limit of Cu in molten solders based on the Cu-Sn phase diagram. The correlation between the metallurgical aspects of interfacial eta(Cu6Sn5) phase formation and dissolution kinetics of Cu in molten solders leads to an understanding of the mechanism that controls the dissolution rate of Cu in molten solders. (c) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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