n-type conductivity and phase transition in ultrananocrystalline diamond films by oxygen ion implantation and annealing

被引:57
作者
Hu, X. J. [1 ]
Ye, J. S. [2 ]
Liu, H. J. [1 ]
Shen, Y. G. [3 ]
Chen, X. H. [1 ]
Hu, H. [1 ]
机构
[1] Zhejiang Univ Technol, Coll Chem Engn & Mat Sci, Hangzhou 310014, Zhejiang, Peoples R China
[2] Technol Ctr Hangzhou Iron & Steel Grp Corp, Hangzhou 310022, Zhejiang, Peoples R China
[3] City Univ Hong Kong, Dept Mfg Engn & Engn Management MEEM, Kowloon, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
AMORPHOUS-CARBON FILMS; NANOCRYSTALLINE DIAMOND; RAMAN-SPECTROSCOPY; ELECTRICAL-PROPERTIES; STRUCTURAL-PROPERTIES; GRAIN-BOUNDARIES; PHOSPHORUS; EVOLUTION; SPECTRA; LAYERS;
D O I
10.1063/1.3556741
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ultrananocrystalline diamond (UNCD) films were implanted by oxygen ion and annealed at different temperatures. The electrical and structrual properties of O+-implanted UNCD films were investigated by Hall effects, high-resolution transmission electron microscopy (HRTEM) and uv Raman spectroscopy measurements. The results show that O+-implanted nano-sized diamond grains annealed at 800 degrees C and above give n-type conductivity to the sample and the UNCD film exhibits n-type resistivity with the carrier mobility of 1 similar to 11 cm(2) V-1 s(-1). With O+ dose increasing from 10(15) to 10(16) cm(-2), diamond phase transits to the amorphous carbon phase accompanied by n-type semiconduction transforming to metallic conduction. In the 10(14) cm(-2) O+-implanted UNCD film, some amorphous carbon at grain boundaries transits to diamond phase with annealing temperature (T-a) increasing from 500 degrees C to 800-900 degrees C, and some of diamond grains are found to be converted to amorphous carbon phase again after 1000 degrees C annealing. This phase transition is closely relative to the n-type conductivity of the UNCD films, in which n-type conductivity increases with the amorphous carbon phase transiting to diamond phase in the T-a range of 500-900 degrees C, and it decreases with diamond phase transiting to amorphous carbon phase in the case of 1000 degrees C annealing. It is indicated that the O+-implanted nano-sized diamond grains dominantly control the n-type conductivity of UNCD film in the Ta range of 800-900 degrees C, while the grain-boundary-conduction controls the n-type conductivty in UNCD film annealed at 1000 degrees C. In this case, a novel conduction mechanism that O+-implanted nano-sized diamond grains supply n-type conductivity and the amorphous carbon grain boundaries give a current path to the UNCD films is proposed. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3556741]
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页数:7
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