Adsorption of SO2 on Ni(100) and Ni(111) surfaces

被引：9
|
作者：
Yokoyama, T
Terada, S
Imanishi, A
Kitajima, Y
Kosugi, N
Ohta, T
机构：
[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
[2] INST MOL SCI,OKAZAKI,AICHI 444,JAPAN
来源：
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1996年 / 80卷
关键词：
D O I：
10.1016/0368-2048(96)02946-5
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
Surface structures and electronic properties of submonolayer sulfur dioxide SO2 molecularly adsorbed on Ni(111) and Ni(100) have been investigated by means of S K-edge SEXAFS, S and O K-edge NEXAFS, S 1s and 2p XPS, UPS, and ab initio SCF-MO calculation. S K-edge NEXAFS and SEXAFS have clarified that on both surfaces the SO2 molecule adsorbs with the molecular plane parallel to the surface and with the bridge site occupation of the S atom. The SCF-MO calculation has verified such a flat-lying structure. Charge transfer from the Ni 3d band to the SO2 pi* orbital has also been elucidated by S and O K-edge NEXAFS, S 1s and 2p XPS, UPS and the SCF-MO calculation.
引用
收藏
页码：161 / 164
页数：4
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