Optical characterization of thin Al2O3 layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

被引：0

作者：

Dywel, Piotr ^{[1
]}

Skowronski, Lukasz ^{[1
]}

机构：

[1] UTP Univ Sci & Technol, Inst Math & Phys, Al Prof S Kaliskiego 7, PL-85796 Bydgoszcz, Poland

来源：

MATERIALS SCIENCE-POLAND | 2020年 / 38卷 / 01期

关键词：

Al2O3; GIMS; refractive index; light transmittance; glazing; MICROSTRUCTURAL PROPERTIES; GAS INJECTION; BAND-GAP; FILMS; COATINGS; ALUMINA;

D O I：

10.2478/msp-2019-0093

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this study, thin Al2O3 films (11 nm - 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and investigated by means of atomic force microscopy, spectroscopic ellipsometry and spectrophotometry. Quite low values of optical constants (1.581 to 1.648 at lambda = 550 nm) of the alumina films are directly associated with specific growth conditions (pulse injection of the reactive or reactive + inert gas) in the pulse gas injection magnetron sputtering process. The light transmittance of Al2O3/glass systems (86 % to 90 %) is only a few percent lower than that calculated for glass (93 %).

引用

页码：108 / 115

页数：8

共 50 条

[41] Optical properties of amorphous Al2O3 thin films prepared by a sol-gel process [J].

Hu, Baofu ;

Yao, Manwen ;

Xiao, Ruihua ;

Chen, Jianwen ;

Yao, Xi .

CERAMICS INTERNATIONAL, 2014, 40 (09) :14133-14139

[42] Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers [J].

Garcia-Valenzuela, J. A. ;

Rivera, R. ;

Morales-Vilches, A. B. ;

Gerling, L. G. ;

Caballero, A. ;

Asensi, J. M. ;

Voz, C. ;

Bertomeu, J. ;

Andreu, J. .

THIN SOLID FILMS, 2016, 619 :288-296

[43] Optical And Local Structural Study Of Gd Doped ZrO2 Thin Films Deposited By RF Magnetron Sputtering Technique [J].

Haque, S. Maidul ;

Shinde, D. D. ;

Misal, J. S. ;

Jha, S. N. ;

Bhattacharyya, D. ;

Sahoo, N. K. .

PROCEEDINGS OF THE 59TH DAE SOLID STATE PHYSICS SYMPOSIUM 2014 (SOLID STATE PHYSICS), 2015, 1665

[44] Structure and properties of Al2O3 thin films deposited by ALD process [J].

Borylo, P. ;

Lukaszkowicz, K. ;

Szindler, M. ;

Kubacki, J. ;

Balin, K. ;

Basiaga, M. ;

Szewczenko, J. .

VACUUM, 2016, 131 :319-326

[45] Optical and Structural Properties of TiO2 Thin Films Deposited by RF Magnetron Sputtering [J].

R. Shakoury ;

A. Zarei .

Silicon, 2019, 11 :1247-1252

[46] Electronic and optical properties of MoS2 thin films deposited by magnetron sputtering studying [J].

Belikov, A., I ;

Phyo, Kyaw Zin ;

Kalinin, V. N. ;

Semochkin, A., I .

INTERNATIONAL CONFERENCE ON MICRO- AND NANO-ELECTRONICS 2018, 2019, 11022

[47] Optical and Structural Properties of TiO2 Thin Films Deposited by RF Magnetron Sputtering [J].

Shakoury, R. ;

Zarei, A. .

SILICON, 2019, 11 (03) :1247-1252

[48] Metallization of Thin Al2O3 Layers in Power Electronics Using Cold Gas Spraying [J].

Donner, Kerstin-Raffaela ;

Gaertner, Frank ;

Klassen, Thomas .

JOURNAL OF THERMAL SPRAY TECHNOLOGY, 2011, 20 (1-2) :299-306

[49] Atomic Layer Deposited Al2O3 Barrier Layers on Flexible PET Substrates [J].

Chang, Rwei-Ching ;

Hou, Hsi-Ting ;

Tsai, Fa-Ta ;

Jhu, Pei-Sin .

APPLIED SCIENCE AND PRECISION ENGINEERING INNOVATION, PTS 1 AND 2, 2014, 479-480 :80-+

[50] A Study Corrosion Properties by Magnetron Sputtered Nanocrystalline Al2o3 Thin Films [J].

Hamil, Muslim Idan ;

Khalaf, Mohammed K. ;

AL-Shakban, Mundher .

EGYPTIAN JOURNAL OF CHEMISTRY, 2022, 65 (11) :413-419

← 1 2 3 4 5 →