Optical characterization of thin Al2O3 layers deposited by magnetron sputtering technique at industrial conditions for applications in glazing

被引：0
|
作者：
Dywel, Piotr [1 ]
Skowronski, Lukasz [1 ]
机构：
[1] UTP Univ Sci & Technol, Inst Math & Phys, Al Prof S Kaliskiego 7, PL-85796 Bydgoszcz, Poland
来源：
MATERIALS SCIENCE-POLAND | 2020年 / 38卷 / 01期
关键词：
Al2O3; GIMS; refractive index; light transmittance; glazing; MICROSTRUCTURAL PROPERTIES; GAS INJECTION; BAND-GAP; FILMS; COATINGS; ALUMINA;
D O I：
10.2478/msp-2019-0093
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this study, thin Al2O3 films (11 nm - 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and investigated by means of atomic force microscopy, spectroscopic ellipsometry and spectrophotometry. Quite low values of optical constants (1.581 to 1.648 at lambda = 550 nm) of the alumina films are directly associated with specific growth conditions (pulse injection of the reactive or reactive + inert gas) in the pulse gas injection magnetron sputtering process. The light transmittance of Al2O3/glass systems (86 % to 90 %) is only a few percent lower than that calculated for glass (93 %).
引用
收藏
页码：108 / 115
页数：8
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