Modeling of the φ(2) susceptibility time-evolution in thermally poled fused silica

被引:47
作者
Kudlinski, A [1 ]
Quiquempois, Y [1 ]
Martinelli, G [1 ]
机构
[1] Univ Sci & Technol, Lab Phys Lasers Atomes & Mol, F-59655 Villeneuve Dascq, France
关键词
D O I
10.1364/OPEX.13.008015
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The dynamics of the second-order nonlinearity induced in a thermally poled Infrasil (TM) silica glass is experimentally and theoretically studied. 200 mu m and 500 mu m-thick samples have been poled for different durations varying from 1 minute to 100 minutes. After the poling process, the magnitude and the spatial distribution of the induced chi((2)) susceptibility have been characterized accurately with the "layer peeling" method. A two-charge carrier model with an electric field dependant charge injection is used to explain the experimental time-evolution of the chi((2)) profiles. A good agreement between experimental results and simulations is reported. (c) 2005 Optical Society of America.
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收藏
页码:8015 / 8024
页数:10
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