Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa

The majority of plasma polymerization sources operate at pressures higher than 1 Pa. At these pressures most common deposition methods do not show significant directionality. One way of enhancing the directional effects is to decrease the working pressure to increase the mean free path of the reactive molecules. The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency (RF) (13.56 MHz, capacitive coupled) tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The plasma parameters were obtained using a double Langmuir probe. Plasma density in the range n(i) = 10(13)-10(16) m (3) was obtained in various parts of the discharge under typical conditions. The presence of the magnetic field led to the presence of relatively strong electric fields (10(3)Vm(-1)) and relatively high electron energies up to several tens of eV in the plasma.