A high-speed particle-detection in a large area using line-laser light scattering

被引:22
作者
Kim, Min Su [1 ,2 ]
Choi, Hyeun-Seok [3 ]
Lee, Seung Hee [4 ,5 ]
Kim, Chanjoong [1 ,2 ]
机构
[1] Kent State Univ, Chem Phys Interdisciplinaty Program, Kent, OH 44242 USA
[2] Kent State Univ, Liquid Czystal Inst, Kent, OH 44242 USA
[3] Korea Inst Ind Technol KITECH, Smart Syst Res Grp, Cheonan Si 331825, Chungnam, South Korea
[4] Chonbuk Natl Univ, Appl Mat Inst BIN Convergence, Dept BIN Fus Technol, Jeonju 561756, Jeonbuk, South Korea
[5] Chonbuk Natl Univ, Dept Polymer Nano Sci & Technol, Jeonju 561756, Jeonbuk, South Korea
关键词
Bidirectional reflectance distribution function; Line laser; Surface light scattering; Surface inspection; SURFACE-ROUGHNESS; MICROROUGHNESS; POLARIZATION; SILICON; PLANE; DEFECTS; REGIMES; SPHERES; OPTICS; TERMS;
D O I
10.1016/j.cap.2015.04.042
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We study the optical characteristics of a home-built line-laser surface light scattering system that detects sub-micron scale irregularities on a large area in high speeds. The sensitivity of the detection system, i.e. signal to noise (STN) ratio, is found to depend strongly on the detection angle. We find an optimal detection angle at 30 degrees, at which STN ratio is maximized for 2500 nm silica particles on wafer surface. Experimental results of scattering intensity measurements from a smooth surface and from surfaces with spherical irregularities are in excellent agreement with corresponding theoretical model calculations. The line scan speed can be as high as -17 mm/s, while identifying the presence of a particle as small as 700 nm in a pixel area (similar to 15 mu m x similar to 17 mu m). The presence of irregularities found by the line scan system is confirmed by confocal laser-scanning microscopy imaging. Due to unique advantages such as non-disruptiveness, high-speed over large area, and high sensitivity, this line scan system may be used as a surface inspection system that meets the requirements of recent flat panel display manufacturing environments. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:930 / 937
页数:8
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