Optical, structural and electrochromic properties of nickel oxide films produced by sol-gel technique

被引:38
作者
Purushothaman, K. K. [2 ]
Antony, S. Joseph [1 ]
Muralidharan, G. [1 ]
机构
[1] Gandhigram Rural Inst Deemed Univ, Dept Phys, Gandhigram 624302, India
[2] TRP Engn Coll, Dept Phys, SRM Grp, Irungalur 621105, Trichy, India
关键词
Thin films; Sol-gel; Electrochromics; NiO; NIOX THIN-FILMS; DEPOSITION; TRANSPARENT; BEHAVIOR;
D O I
10.1016/j.solener.2011.02.012
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Nickel oxide films have been deposited from nickel acetate precursor using a sol gel dip coating method, onto glass and conducting fluorine doped tin oxide (FTO) glass substrate. The direct energy gap (E-gd) values for the 2-10 layered films are in the range of 3.62 eV-3.72 eV. X-ray diffraction (XRD) analysis reveals that films consisting of 2-6 layers are amorphous, while films consisting of 8-10 layers are poly-crystalline with cubic grains of around 12 nm-20 nm and preferential growth along the (1 1 1) and (2 0 0) planes. Fourier Transform Infrared (FTIR) spectrum confirms the formation of Ni-O. Electrochromic properties of the nickel oxide coatings were studied using cyclic voltammetric (CV) technique. The 8 layered NiO films exhibit the anodic/cathodic diffusion coefficient of 16.7/5.73 x 10(-13) cm(2)/s and the change in optical transmission is Delta T-630nm = 53% with a photopic contrast ratio of 2.87. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:978 / 984
页数:7
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