In situ transmission electron microscopy study of dielectric breakdown of surface oxides during electric field-assisted sintering of nickel nanoparticles

被引：28

作者：

Bonifacio, Cecile S. ^{[1
]}

Rufner, Jorgen F. ^{[1
]}

Holland, Troy B. ^{[1
]}

van Benthem, Klaus ^{[1
]}

机构：

[1] Univ Calif Davis, Div Mat Sci & Engn, Dept Chem Engn & Mat Sci, Davis, CA 95616 USA

来源：

APPLIED PHYSICS LETTERS | 2012年 / 101卷 / 09期

基金：

美国国家科学基金会;

关键词：

PLASMA SINTERING/SYNTHESIS PROCESS; FUNDAMENTAL INVESTIGATIONS; GATE STACKS; REACTIVITY; DEVICES; FILMS;

D O I：

10.1063/1.4749284

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The removal of ultra-thin oxide surface layers on nanometric nickel particles is investigated in the framework of electric field-induced dielectric breakdown. In situ transmission electron microscopy was used to directly apply electrical biasing to agglomerates of nanoparticles during simultaneous imaging of the contact area between two adjacent particles. The applied electrical field initiated dielectric breakdown of the surface layers through percolation of oxygen vacancies and the migration of oxygen away from the particle contact, which leads to the formation of metallic necks and their subsequent growth. The experimental results represent direct evidence for surface cleaning effects during electric field-assisted sintering. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4749284]

引用

页数：5

共 26 条

[1] Fundamental investigations on the spark plasma sintering/synthesis process III. Current effect on reactivity [J].

Anselmi-Tamburini, U ;

Garay, JE ;

Munir, ZA .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2005, 407 (1-2) :24-30

[2] Spark plasma sintering and characterization of bulk nanostructured fully stabilized zirconia: Part I. Densification studies [J].

Anselmi-Tamburini, U ;

Garay, JE ;

Munir, ZA ;

Tacca, A ;

Maglia, F ;

Spinolo, G .

JOURNAL OF MATERIALS RESEARCH, 2004, 19 (11) :3255-3262

[3] Mapping chemical and bonding information using multivariate analysis of electron energy-loss spectrum images [J].

Bosman, M. ;

Watanabe, M. ;

Alexander, D. T. L. ;

Keast, V. J. .

ULTRAMICROSCOPY, 2006, 106 (11-12) :1024-1032

[4] Fundamental investigations on the spark plasma sintering/synthesis process - I. Effect of dc pulsing on reactivity [J].

Chen, W ;

Anselmi-Tamburini, U ;

Garay, JE ;

Groza, JR ;

Munir, ZA .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2005, 394 (1-2) :132-138

[5]

Fleetwood D. M., 2008, DEFECTS MICROELECTRO, DOI DOI 10.1201/9781420043778

[6] ELECTRICAL-CONDUCTION AND DIELECTRIC-BREAKDOWN IN CRYSTALLINE NIO AND NIO(LI) FILMS [J].

FUSCHILLO, N ;

LALEVIC, B ;

LEUNG, B .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) :310-316

[7] Sintering activation by external electrical field [J].

Groza, JR ;

Zavaliangos, A .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2000, 287 (02) :171-177

[8] THE LOCALIZATION AND CRYSTALLOGRAPHIC DEPENDENCE OF SI SUBOXIDE SPECIES AT THE SIO2/SI INTERFACE [J].

GRUNTHANER, PJ ;

HECHT, MH ;

GRUNTHANER, FJ ;

JOHNSON, NM .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (02) :629-638

[9] Local field strengths during early stage field assisted sintering (FAST) of dielectric materials [J].

Holland, Troy B. ;

Anselmi-Tamburini, Umberto ;

Quach, Dat V. ;

Tran, Tien B. ;

Mukherjee, Amiya K. .

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2012, 32 (14) :3659-3666

[10] Field assisted sintering of nickel nanoparticles during in situ transmission electron microscopy [J].

Holland, Troy B. ;

Thron, Andrew M. ;

Bonifacio, Cecile S. ;

Mukherjee, Amiya K. ;

van Benthem, Klaus .

APPLIED PHYSICS LETTERS, 2010, 96 (24)

← 1 2 3 →