Density and index of refraction of water ice films vapor deposited at low temperatures

被引:174
作者
Westley, MS
Baratta, GA
Baragiola, RA [1 ]
机构
[1] Univ Virginia, Lab Atom & Surface Phys, Charlottesville, VA 22901 USA
[2] Osservatorio Astrofis Catania, I-95125 Catania, Italy
关键词
D O I
10.1063/1.475730
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The density of 0.5-3 mu m thick vapor-deposited films of water ice were measured by combined optical interferometry and microbalance techniques during deposition on an optically flat gold substrate from a capillary array gas source. The films were of high optical quality with an index of refraction of 1.29+/-0.01 at 435.8 nm, a density of 0.82+/-0.01 g/cm(3), and a porosity of 0.13+/-0.01. In contrast to previous studies, none of the measured properties exhibited any significant variation with growth rate or temperature over the range studied (0.6-2 nm/min, 20-140 K). (C) 1998 American Institute of Physics.
引用
收藏
页码:3321 / 3326
页数:6
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