Carrier capture processes in strain-induced InxGa1-xAs/GaAs quantum dot structures

被引:11
作者
Lingk, C
Helfer, W
von Plessen, G
Feldmann, J
Stock, K
Feise, MW
Citrin, DS
Lipsanen, H
Sopanen, M
Virkkala, R
Tulkki, J
Ahopelto, J
机构
[1] Univ Munich, Dept Phys, Photon & Optoelect Grp, D-80799 Munich, Germany
[2] Univ Munich, CENS, D-80799 Munich, Germany
[3] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[4] Washington State Univ, Dept Phys, Pullman, WA 99164 USA
[5] Washington State Univ, Mat Res Ctr, Pullman, WA 99164 USA
[6] Helsinki Univ Technol, Optoelect Lab, Otakaari IM, FIN-02150 Espoo, Finland
[7] Helsinki Univ Technol, Lab Computat Engn, FIN-02015 Helsinki, Finland
关键词
D O I
10.1103/PhysRevB.62.13588
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate carrier capture processes in strain-induced quantum dot structures. The quantum dots consist of a near-surface InGaAs/GaAs quantum well in which a lateral confining potential is generated by the strain from InP stressor islands grown on the sample surface. Using photoluminescence spectroscopy, we show that the rate of carrier capture into the quantum dots increases dramatically when the energetic depth of the confinement potential is reduced by enlarging the quantum well/surfate separation D. While carriers in the quantum well region between the quantum dots are found to experience D-dependent nonradiative surface recombination, this process seems to be negligible for carriers in the quantum dots, presumably due to the protecting InP islands.
引用
收藏
页码:13588 / 13594
页数:7
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