Scanning reflection ion microscopy in a helium ion microscope

被引:5
作者
Petrov, Yuri V. [1 ]
Vyvenko, Oleg F. [2 ]
机构
[1] St Petersburg State Univ, Interdisciplinary Resource Ctr Nanotechnol, St Petersburg 198504, Russia
[2] St Petersburg State Univ, Fac Phys, St Petersburg 198504, Russia
来源
BEILSTEIN JOURNAL OF NANOTECHNOLOGY | 2015年 / 6卷
关键词
helium ion microscope; low-angle ion scattering; reflection microscopy; surface imaging; surface morphology; ELECTRON-MICROSCOPY; CONTRAST; SURFACE; DIFFRACTION; IMAGE;
D O I
10.3762/bjnano.6.114
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Reflection ion microscopy (RIM) is a technique that uses a low angle of incidence and scattered ions to form an image of the specimen surface. This paper reports on the development of the instrumentation and the analysis of the capabilities and limitations of the scanning RIM in a helium ion microscope (HIM). The reflected ions were detected by their "conversion" to secondary electrons on a platinum surface. An angle of incidence in the range 5-10 degrees was used in the experimental setup. It was shown that the RIM image contrast was determined mostly by surface morphology but not by the atomic composition. A simple geometrical analysis of the reflection process was performed together with a Monte Carlo simulation of the angular dependence of the reflected ion yield. An interpretation of the RIM image formation and a quantification of the height of the surface steps were performed. The minimum detectable step height was found to be approximately 5 nm. RIM imaging of an insulator surface without the need for charge compensation was successfully demonstrated.
引用
收藏
页码:1125 / 1137
页数:13
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