Titanium nitride - Silicon nitride composite coatings deposited by reactive magnetron sputtering

被引:0
|
作者
Patscheider, J [1 ]
Diserens, M
Levy, F
机构
[1] Eidgenoss Mat Prufungs & Forsch Anstalt, CH-8600 Dubendorf, Switzerland
[2] Ecole Polytech Fed Lausanne, Inst Appl Phys, CH-1015 Lausanne, Switzerland
来源
关键词
composite coatings; titanium nitride-silicon; reactive magnetron sputtering;
D O I
10.4028/www.scientific.net/MSF.287-288.267
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:267 / 267
页数:1
相关论文
共 50 条
  • [41] Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering
    Merie, Violeta Valentina
    Molea, Andreia
    Burnete, Vlad Nicolae
    Neamtu, Bogdan Viorel
    Negrea, Gavril
    POWDER METALLURGY AND ADVANCED MATERIALS, 2018, 8 : 134 - 142
  • [42] Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering
    Lim, JW
    Park, HS
    Park, TH
    Lee, JJ
    Joo, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (02): : 524 - 528
  • [43] Structure and lubricated tribological behavior of silicon incorporated carbon nitride composite films deposited by magnetron sputtering
    Liu, D. G.
    Zheng, L.
    Liu, J. Q.
    Luo, L. M.
    Wu, Y. C.
    DIAMOND AND RELATED MATERIALS, 2018, 82 : 115 - 123
  • [44] Influence of the magnetron on the growth of aluminum nitride thin films deposited by reactive sputtering
    Iriarte, G. F.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (02): : 193 - 198
  • [45] Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering
    Serdean, Florina Maria
    Merie, Violeta Valentina
    Negrea, Gavril
    Crisan, Horea George
    POWDER METALLURGY AND ADVANCED MATERIALS, 2018, 8 : 212 - 218
  • [46] Microstresses in molybdenum nitride thin films deposited by reactive DC magnetron sputtering
    Shen, YG
    RESIDUAL STRESSES VII, PROCEEDINGS, 2005, 490-491 : 589 - 594
  • [47] Adhesion analysis for chromium nitride thin films deposited by reactive magnetron sputtering
    Rusu, F. M.
    Merie, V. V.
    Pintea, I. M.
    Molea, A.
    7TH INTERNATIONAL CONFERENCE ON ADVANCED CONCEPTS IN MECHANICAL ENGINEERING, 2016, 147
  • [48] Effects of substrate bias frequencies on the characteristics of chromium nitride coatings deposited by pulsed DC reactive magnetron sputtering
    Lee, Jyh-Wei
    Kuo, Yu-Chu
    Wang, Chaur-Jeng
    Chang, Li-Chun
    Liu, Kuan-Ting
    SURFACE & COATINGS TECHNOLOGY, 2008, 203 (5-7): : 721 - 725
  • [49] Deposition and characterization of titanium aluminum nitride coatings prepared by RF magnetron sputtering
    Ait-Djafer, Amina Zouina
    Saoula, Nadia
    Aknouche, Hamid
    Guedouar, Bendiba
    Madaoui, Noureddine
    APPLIED SURFACE SCIENCE, 2015, 350 : 6 - 9
  • [50] Studies of photoluminescence of silicon nitride thin films deposited by RF magnetron sputtering
    Jia, Xiaoyun
    Xu, Zheng
    Zhao, Suling
    Zhou, Chunlan
    Li, Yuan
    Tang, Yu
    AD'07: Proceedings of Asia Display 2007, Vols 1 and 2, 2007, : 2155 - 2158