Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

被引：112
作者：
Ma, YJ
Yang, HN
Guo, J
Sathe, C
Agui, A
Nordgren, J
机构：
[1] Sharp Microelect Technol Inc, Camas, WA 98607 USA
[2] Uppsala Univ, Dept Phys, Uppsala, Sweden
来源：
APPLIED PHYSICS LETTERS | 1998年 / 72卷 / 25期
关键词：
D O I：
10.1063/1.121601
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a-CFx is mostly of carbon rings connected by CF2 groups. The cross linking increases with substrate temperature. (C) 1998 American Institute of Physics. [S0003-6951(98)04525-2].
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页码：3353 / 3355
页数：3
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