Large optical polarization anisotropy due to anisotropic in-plane strain in m-plane GaInN quantum well structures grown on m-plane 6H-SiC

被引:17
作者
Joenen, H. [1 ]
Bremers, H. [1 ]
Langer, T. [1 ]
Rossow, U. [1 ]
Hangleiter, A. [1 ]
机构
[1] Tech Univ Carolo Wilhelmina Braunschweig, Inst Appl Phys, D-38106 Braunschweig, Germany
关键词
STACKING-FAULTS; WURTZITE GAN; PHOTOLUMINESCENCE; GAMMA-LIALO2; ABSORPTION; FIELDS; DIODES;
D O I
10.1063/1.3702786
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigated the optical polarization anisotropy of m-plane GaInN/GaN quantum well structures on m-plane SiC and bulk GaN substrates. On bulk GaN, the degree of polarization increases with increasing indium content according to the larger strain-induced separation of the topmost valence bands. On m-plane SiC, however, we observe constantly large polarization ratios of around 90% and more. From an x-ray strain state analysis and calculations of the valence band energies, we find that an anisotropic strain of the GaN buffer layer leads to a very strong separation of the topmost valence bands resulting in a large degree of polarization. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3702786]
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页数:4
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