Birefringence Analysis of the Effect of Electric Fields on the Order-Disorder Transition Temperature of Lamellae Forming Block Copolymers

被引：11

作者：

Kathrein, Christine C. ^{[1
]}

Kipnusu, Wycliffe K. ^{[2
]}

Kremer, Friedrich ^{[2
]}

Boeker, Alexander ^{[3
]}

机构：

[1] Rhein Westfal TH Aachen, DWI Leibniz Inst Interakt Mat, Lehrstuhl Makromol Mat & Oberflachen, D-52062 Aachen, Germany

[2] Univ Leipzig, Inst Expt Phys, D-04103 Leipzig, Germany

[3] Univ Potsdam, Fraunhofer Inst Angew Polymerforsch IAP, Lehrstuhl Polymermat & Polymertechnol, D-14476 Potsdam, Germany

来源：

MACROMOLECULES | 2015年 / 48卷 / 10期

关键词：

MICROPHASE SEPARATION; DIBLOCK COPOLYMERS; PHASE-TRANSITIONS; ORIENTATION; ALIGNMENT; POLYMERS; FILMS; GRAPHOEPITAXY; DILUTION; BEHAVIOR;

D O I：

10.1021/acs.macromol.5b00512

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A detailed birefringence analysis of the effect of strong dc electric fields on the order-disorder transition temperature (T-ODT) of lamella forming block copolymers is reported. The setup presented here enabled the measurement of the T-ODT with high temperature resolution while the birefringence measurements were nondestructive and straightforward compared to alternative methods. A downward shift in the transition temperature was found for all samples upon application of the electric field. The data indicate that the dominating parameter that evokes the mixing of block copolymers when exposed to electric fields is the difference in dielectric permittivity Delta epsilon between the block copolymer constituents. The extent to which the T-ODT is shifted is furthermore influenced by the degree of polymerization N. Shifts in the transition temperature of up to 7 degrees C were found upon application of an electric field of 5 kV/mm.

引用

页码：3354 / 3359

页数：6

共 56 条

[11] Pathways to macroscale order in nanostructured block copolymers [J].

Chen, ZR ;

Kornfield, JA ;

Smith, SD ;

Grothaus, JT ;

Satkowski, MM .

SCIENCE, 1997, 277 (5330) :1248-1253

[12] Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers [J].

Cheng, Joy Y. ;

Rettner, Charles T. ;

Sanders, Daniel P. ;

Kim, Ho-Cheol ;

Hinsberg, William D. .

ADVANCED MATERIALS, 2008, 20 (16) :3155-3158

[13] Templated self-assembly of block copolymers: Effect of substrate topography [J].

Cheng, JY ;

Ross, CA ;

Thomas, EL ;

Smith, HI ;

Vancso, GJ .

ADVANCED MATERIALS, 2003, 15 (19) :1599-+

[14] Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry -: art. no. 036104 [J].

Daoulas, KC ;

Müller, M ;

Stoykovich, MP ;

Park, SM ;

Papakonstantopoulos, YJ ;

de Pablo, JJ ;

Nealey, PF ;

Solak, HH .

PHYSICAL REVIEW LETTERS, 2006, 96 (03)

[15] ELECTRICAL FIELD EFFECT ON CRITICAL OPALESCENCE [J].

DEBYE, P ;

KLEBOTH, K .

JOURNAL OF CHEMICAL PHYSICS, 1965, 42 (09) :3155-&

[16] Ellipsometric determination of Flory-Huggins interaction parameters in solution [J].

Elbs, H ;

Krausch, G .

POLYMER, 2004, 45 (23) :7935-7942

[17] THEORY OF BLOCK COPOLYMER SOLUTIONS - NONSELECTIVE GOOD SOLVENTS [J].

FREDRICKSON, GH ;

LEIBLER, L .

MACROMOLECULES, 1989, 22 (03) :1238-1250

[18] Large-scale alignment of ABC block copolymer microdomains via solvent vapor treatment [J].

Fukunaga, K ;

Elbs, H ;

Magerle, R ;

Krausch, G .

MACROMOLECULES, 2000, 33 (03) :947-953

[19] Order-Disorder Transition and Alignment Dynamics of a Block Copolymer Under High Magnetic Fields by In Situ X-Ray Scattering [J].

Gopinadhan, Manesh ;

Majewski, Pawel W. ;

Choo, Youngwoo ;

Osuji, Chinedum O. .

PHYSICAL REVIEW LETTERS, 2013, 110 (07)

[20] Solvothermal Annealing of Block Copolymer Thin Films [J].

Gotrik, Kevin W. ;

Ross, C. A. .

NANO LETTERS, 2013, 13 (11) :5117-5122

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