Selector-less Graphite Memristor: Intrinsic Nonlinear Behavior with Gap Design Method for Array Applications

被引:4
作者
Chen, Ying-Chen [1 ]
Chang, Yao-Feng [2 ]
Lee, Jack C. [1 ]
机构
[1] Univ Texas Austin, Dept Elect & Comp Engn, Austin, TX 78758 USA
[2] Micron Technol Inc, Dept Technol & Dev, Boise, ID 83706 USA
来源
ENGINEERING CARBON HYBRIDS - CARBON ELECTRONICS 3 | 2018年 / 85卷 / 01期
关键词
RESISTIVE SWITCHING CHARACTERISTICS; FEOX-TRANSITION LAYER; MEMORY; MECHANISM; VOLTAGE;
D O I
10.1149/08501.0011ecst
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The memristors in binary metal oxide structures have attracted attentions since the current nonvolatile memory (NVM) has been approaching the scaling limit. Memristors having excellent scalability, high speed, and low power operation, is desired for current hardware needs and future artificial intelligence in-memory computational hardware platform. In high-density cross-bar array architecture, selector devices are essential to suppress the sneak path current and to avoid the reading errors. Despite that the additional selector device has commonly been proposed one selector-one resistor (1S1R) design for array applications, it rises the process complexity and cost. In this work, selectorless 1R-only graphite-based memristor devices have been demonstrated by utilizing the nonlinear (NL) resistive switching (RS) characteristics with SET compliance and gap design method for memristor array applications.
引用
收藏
页码:11 / 19
页数:9
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