Electrical characterization of Si/InN nanowire heterojunctions

被引:6
作者
Alagha, S. [1 ]
Zhao, S. [2 ]
Mi, Z. [2 ,3 ]
Watkins, S. P. [1 ]
Kavanagh, K. L. [1 ]
机构
[1] Simon Fraser Univ, Phys Dept, Burnaby, BC V5A 1S6, Canada
[2] McGill Univ, Dept Elect & Comp Engn, Montreal, PQ H3A 0E9, Canada
[3] Univ Michigan, Dept Elect Engn & Comp Sci, Ctr Photon & Multiscale Nanomat, 1301 Beal Ave, Ann Arbor, MI 48105 USA
基金
加拿大自然科学与工程研究理事会;
关键词
InN; heterojunction; electrical transport; nanoprobe; INN NANOWIRES; PHOTOLUMINESCENCE; TRANSPORT; EPILAYERS;
D O I
10.1088/1361-6641/aa9b57
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the electrical properties of undoped, Si-doped and Mg-doped InN nanowires measured directly on degenerate n-type and p-type Si substrates. The transport was measured with a nanoprobe technique inside a scanning electron microscope. The resulting average current density versus voltage characteristics are weakly rectifying for InN grown on n(+)-Si with similar ratios for all InN dopant types. On p(+)-Si, Mg-doped InN nanowires show a strong rectification behavior with opposite voltage polarity compared to n(+)-Si, while undoped and Si-doped nanowires show nearly symmetric transport. These characteristics are analyzed in terms of the properties of broken gap band offsets at the Si/InN heterojunction.
引用
收藏
页数:10
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