Effect of current density and grain refining agents on pulsed electrodeposition of nanocrystalline nickel

被引:27
作者
Bhardwaj, M. [2 ]
Balani, K. [3 ]
Balasubramaniam, R. [3 ]
Pandey, S. [3 ]
Agarwal, A. [1 ]
机构
[1] Florida Int Univ, Dept Mech & Mat Engn, Miami, FL 33174 USA
[2] Indian Inst Technol, Dept Met & Mat Engn, Roorkee 247667, Uttar Pradesh, India
[3] Indian Inst Technol, Dept Mat & Met Engn, Kanpur 208016, Uttar Pradesh, India
关键词
Pulsed current electrodeposition; Nanocrystalline nickel; Complexing agent; Coercivity; Nanoindentation; MECHANICAL-PROPERTIES; OPTICAL-PROPERTIES; FILMS; SACCHARIN; SILICON; PLASMA; NANOCOMPOSITE; PARAMETERS; COATINGS; ALLOYS;
D O I
10.1179/026708410X12683118611185
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanocrystalline nickel was electrodeposited on copper substrate using a Watt's bath at a temperature of 50 degrees C. The effect of pulsed current density (up to 1.5 A cm(-2)) and role of organic additives (namely saccharin and sodium citrate) in the deposition bath was evaluated for rendering grain refinement. The deposited samples were characterised for current efficiency, colonial morphology, crystallite size, texture, coercivity and nanomechanical properties (such as Young's modulus and hardness). Results were compared with deposition using direct current, and utilising annealed Cu substrate. The smallest crystallite size of 22 nm was obtained, and the lowest coercivity equaled 22 Oe for the sample deposited using pulsed current with the peak current density 1 A cm(-2) and 10 g L-1 saccharin addition. Annealing of the substrate has shown to increase the Young's modulus of electrodeposited Ni by 10.2%, which increases further by 14.4% with saccharin addition when compared to those of deposits without saccharin addition.
引用
收藏
页码:642 / 648
页数:7
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