Bilateral gradient defect engineering integrated atomic in-layer homojunctions for efficient photoelectrochemical water splitting

被引:3
|
作者
Feng, Chuanzhen [1 ]
Wu, Yu [1 ]
Fu, Yaling [1 ]
Zhang, Huijuan [1 ]
Wang, Yu [1 ,2 ]
机构
[1] Chongqing Univ, Sch Chem & Chem Engn, State Key Lab Power Transmiss Equipment & Syst Sec, 174 Shazheng St, Chongqing 400044, Peoples R China
[2] Chongqing Univ, Sch Elect Engn, 174 Shazheng St, Chongqing City 400044, Peoples R China
基金
中国国家自然科学基金;
关键词
Bilateral gradient defects; Atomic in-layer homojunctions; Pyramid -like" band alignment; Photoelectrochemical water reduction; PHOTOCATALYTIC ACTIVITY; CHARGE SEPARATION; PERFORMANCE; TRANSPORT; OXYGEN; ZNO;
D O I
10.1016/j.apsusc.2022.154810
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Severe recombination of photo-generated carriers restricts the application of photoelectrochemical water split-ting. Designing carrier spatial separation paths at the atomic level is an innovative but challenging strategy to address this problem. Herein, we first propose a gradient defect model confined in atomic layers. Bilateral gradient Cd doping terminated at the outer surfaces of five-atomic-layer BiOI nanosheets was achieved by a linear pressurized gas-assisted (LPGA) technique with self-adapting oxygen vacancies generated unexpectedly. Different doping concentrations between layers trigger the rearrangement of energy levels, resulting in distributed atomic homojunctions with "pyramid-like " band alignment to synergistic modulate carrier separa-tion. Thus, the gradient Cd doping BiOI displays a charge separation efficiency of 78.1%, which is 12.0 and 7.9 times higher than those for pristine BiOI and uniform doping BiOI. Furthermore, the record photocurrent density of 4.68 mA cm(-2) at 0 VRHE is the highest absolute value of BiOI photocathodes reported to date and outperforms most bismuth-based photocathodes. Our work provides a new method to modulate photo-generated carrier separation at the atomic level and deepens the understanding of homojunction semiconductors.
引用
收藏
页数:10
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