Fluorescent two-photon nanolithography

被引：11

作者：

Kunik, D. ^{[1
]}

Luduena, S. J. ^{[2
]}

Costantino, S. ^{[3
,4
]}

Martinez, O. E. ^{[1
]}

机构：

[1] Univ Buenos Aires, Fac Ciencias Exactas & Nat, Dept Fis, RA-1428 Buenos Aires, DF, Argentina

[2] Univ Buenos Aires, Fac Ciencias Exactas & Nat, Ctr Microscopias Avanzadas, Buenos Aires, DF, Argentina

[3] McGill Univ, Dept Phys, Quebec City, PQ, Canada

[4] McGill Univ, Montreal Neurol Inst, Quebec City, PQ, Canada

来源：

JOURNAL OF MICROSCOPY | 2008年 / 229卷 / 03期

关键词：

lithography; nanolithography; two-photon absorption;

D O I：

10.1111/j.1365-2818.2008.01940.x

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volume of resins by orders of magnitude. This work also shows experimental evidence of surface effects that yield a different polymerization intensity threshold compared with bulk. Such phenomenon enables to perform a non-linear optical nanolithography in a simple way, allowing fast-prototyping procedures. We present a detailed study of the polymer growth process using fluorescence and atomic force microscopy.

引用

页码：540 / 544

页数：5

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