Fabrication of III-V semiconductor quantum dots

被引:1
作者
Akahane, Kouichi [1 ]
Yamamoto, Naokatsu [1 ]
机构
[1] Natl Inst Informat & Commun Technol, Koganei, Tokyo 1848795, Japan
来源
PLASMONICS: NANOIMAGING, NANOFABRICATION, AND THEIR APPLICATIONS V | 2009年 / 7395卷
关键词
quantum dot; self-assembling; III-V semiconductor; optical near-field interaction; SB; SURFACTANT; GROWTH; LASER; SUPERLATTICES; EMISSION; EPITAXY;
D O I
10.1117/12.824233
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We propose a method for the fabrication of self-assembled semiconductor quantum dots (QDs) and the control of their density and emission wavelength. This method would be fundamental toward the fabrication of nanophotonic devices. We used molecular beam epitaxy and fabricated self-assembled QDs from various materials under various growth conditions. We controlled the emission wavelength over a wide range (700-1700 nm) by changing the materials around the QDs. We used antimonide-related materials or a highly stacked structure to control the density of the obtained QDs within the range of 10(8)-10(13)/cm(2).
引用
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页数:10
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