Sputtered iridium oxide for stimulation electrode coatings

被引：0
|
作者：
Mokwa, Wilfried [1 ]
Wessling, Boerge [1 ]
Schnakenberg, Uwe [1 ]
机构：
[1] Rhein Westfal TH Aachen, Inst Mat Elect Engn I, Aachen, Germany
来源：
2007 ANNUAL INTERNATIONAL CONFERENCE OF THE IEEE ENGINEERING IN MEDICINE AND BIOLOGY SOCIETY, VOLS 1-16 | 2007年
关键词：
D O I：
暂无
中图分类号：
R318 [生物医学工程];
学科分类号：
0831 ;
摘要：
This work deals with the reactive RF-powered sputter deposition of iridium oxide for use as the active stimulation layer in functional medical implants. The oxygen gettered by the growing films is determined by an approach based on generic curves. Films deposited at different stages of oxygen integration show strong differences in electrochemical behaviour, caused by different morphologies. The dependence of electrochemical activity on morphology is further illustrated by RF sputtering onto heated substrates, as well as DC sputtering onto cold substrates.
引用
收藏
页码：6048 / 6051
页数：4
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