Sample environment effects on synchrotron-measured temperature profiles in an approximant of optical floating zone crystal growth

被引:1
|
作者
Wang, Yusu [1 ]
Denney, Jonathan J. [1 ]
Corrao, Adam A. [1 ]
Huang, Guanglong [2 ]
Zhang, Mojue [2 ]
Soundararajan, Praveen [2 ]
Montiel, David [2 ]
Thornton, Katsuyo [2 ]
Khalifah, Peter G. [1 ,3 ]
机构
[1] SUNY Stony Brook, Dept Chem, Stony Brook, NY 11794 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[3] Brookhaven Natl Lab, Dept Chem, Upton, NY 11973 USA
关键词
A2; Floating Zone Technique; A1; X-ray Diffraction; Computer Simulation; Solidification; Single Crystal Growth; Image Analysis; IMAGING FURNACE; MOLTEN ZONE; ALUMINUM; OXIDE;
D O I
10.1016/j.jcrysgro.2021.126331
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Even though the growth of crystals using optical floating zone furnaces has had an immense scientific impact, the implementation of this method remains more of an art than a science due to the difficulty of obtaining quan-titative information about the sample thermal profile during crystal growth. Building on recent work demon-strating that in sita synchrotron studies can be used to map sample rod temperatures during heating, investigations were carried out to better understand how the sample environment affects the sample temperature profile. Through a combination of experimental studies and modeling efforts, it is shown that the environment in the furnace can strongly influence the sample temperature at the lamp focus, the steepness of the vertical temperature gradient, and the timescale required for sample heating and cooling - effects which can combine to produce a strong history-dependence to sample temperature profiles. It is demonstrated that the furnace effects can be effectively captured in thermal models, allowing both the steady-state and time-dependent behavior of the sample to be accurately reproduced with predictive models and providing a launching point for improved furnace designs that can more readily deliver desired thermal profiles.
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页数:8
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