Design and properties analysis of multi-layer dielectric used in pulse compressor gratings

被引：15
作者：
Kong, WJ
Shen, ZC
Shen, J
Shao, JD
Fan, ZX
机构：
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100864, Peoples R China
来源：
OPTIK | 2005年 / 116卷 / 07期
关键词：
pulse compressor gratings; multi-layer dielectric; optic properties analysis; optic film stack design;
D O I：
10.1016/j.ijleo.2005.02.005
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (PCG) are etched by ion-beam and holographic techniques. Diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. On the other hand, they depend greatly on the design of multi-layer. A theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. The influences of coating design on optical characters are described in detail. The analysis shows that a coating stack of H3L (H2L) (boolean AND) 9H0.5L2.01H meets the specifications of PCG well. And there is good agreement of transmission between experimental and the theoretic design. (c) 2005 Elsevier GmbH. All rights reserved.
引用
收藏
页码：325 / 330
页数：6
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