Microstructure and mechanical properties of TiAlN/SiO2 nanomultilayers synthesized by reactive magnetron sputtering

被引:16
|
作者
Li, Wei [1 ]
Liu, Ping [1 ]
Wang, Juntao [2 ]
Ma, Fengcang [1 ]
Liu, Xinkuan [1 ]
Chen, Xiaohong [1 ]
Yang, Lihong [2 ]
机构
[1] Shanghai Univ Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China
[2] Shanghai Univ Sci & Technol, Sch Mech Engn, Shanghai 200093, Peoples R China
关键词
TiAlN/SiO2; nanomultilayer; Magnetron sputtering; Epitaxial growth; Mechanical property; Microstructure; MULTILAYER COATINGS; TIN/NBN; STRESS; FILMS; ZRN; TIN;
D O I
10.1016/j.matlet.2010.11.073
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TiAlN/SiO2 nanomultilayers with different SiO2 layer thickness were synthesized by reactive magnetron sputtering. The microstructure and mechanical properties were investigated by X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and nano-indentation. The results indicated that, under the template effect of Bl-NaCl structural TiAlN layers, amorphous SiO2 was forced to crystallize and grew epitaxially with TiAlN layers when SiO2 layer thickness was below 0.6 nm, resulting in the enhancement of hardness and elastic modulus. The maximum hardness and elastic modulus could respectively reach 37 GPa and 393 GPa when SiO2 layer thickness was 0.6 nm. As SiO2 layer thickness further increased, SiO2 transformed back into amorphous state and broken the coherent growth of nanomultilayers, leading to the decrease of hardness and elastic modulus. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:636 / 638
页数:3
相关论文
共 50 条
  • [21] Nanocomposite Coating with TiAlN and Amorphous Carbon Phases Synthesized by Reactive Magnetron Sputtering
    Kim, Bom Sok
    Kim, Dong Jun
    La, Joung Hyun
    Lee, Sang Yong
    Lee, Sang Yul
    KOREAN JOURNAL OF METALS AND MATERIALS, 2012, 50 (11): : 801 - 808
  • [22] Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering
    Wang, Xuan
    Zhang, Kui
    Yue, Guanghui
    Peng, Dongliang
    Qi, Zhengbing
    Wang, Zhoucheng
    MATERIALS PROCESSING TECHNOLOGIES, PTS 1 AND 2, 2011, 154-155 : 1639 - +
  • [23] Microstructure, mechanical properties and tribological behaviors of TiAlN-Ag composite coatings by pulsed magnetron sputtering method
    Ren, Meng
    Yu, He-long
    Zhu, Li-na
    Li, Hai-qing
    Wang, Hai-dou
    Xing, Zhi-guo
    Xu, Bin-shi
    SURFACE & COATINGS TECHNOLOGY, 2022, 436
  • [24] Microstructure and mechanical properties of (Ti,Al)(O,N) films synthesized by reactive sputtering
    Mei, FH
    Dong, YS
    Li, YR
    Li, GY
    MATERIALS LETTERS, 2006, 60 (03) : 375 - 378
  • [25] The role of copper incorporation on the microstructure, mechanical and tribological properties of TiBN-Cu films by reactive magnetron sputtering
    Asempah, Isaac
    Xu, Junhua
    Yu, Lihua
    Luo, Huang
    Liu, JinLin
    Yu, Dian
    Ding, Ning
    JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 801 : 112 - 122
  • [26] Effect of SiC thickness on microstructure and mechanical properties of (AlCrTiZrV)N/SiC nano-multilayers film synthesized by reactive magnetron sputtering
    Li, Bohan
    Ma, Xun
    Li, Wei
    Zhai, Qingqing
    Liu, Ping
    Zhang, Ke
    Ma, Fengcang
    Wang, Jingjing
    THIN SOLID FILMS, 2021, 730
  • [27] Influence of Si content on the microstructure and mechanical properties of VSiN films deposited by reactive magnetron sputtering
    Xu, Junhua
    Chen, Jian
    Yu, Lihua
    VACUUM, 2016, 131 : 51 - 57
  • [28] Photoluminescence features of Si/SiO2 superlattices produced by reactive magnetron sputtering
    Ternon, C
    Gourbilleau, F
    Portier, X
    Voivenel, P
    Madelon, R
    Rizk, R
    POLYCRYSTALLINE SEMICONDUCTORS IV MATERIALS, TECHNOLOGIES AND LARGE AREA ELECTRONICS, 2001, 80-81 : 249 - 253
  • [29] Si/SiO2 multilayers:: synthesis by reactive magnetron sputtering and photoluminescence emission
    Ternon, C
    Gourbilleau, F
    Rizk, R
    Dufour, C
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2003, 16 (3-4) : 517 - 522
  • [30] Effect of sputtering pressure on the structure and properties of SiO2 films prepared by magnetron sputtering
    Zhao, Leran
    Zhao, Changjiang
    Liu, Juncheng
    Liu, Zhigang
    Chen, Yan
    MICRO & NANO LETTERS, 2020, 15 (12) : 872 - 876