Oxygen sensitivity to the fine structure on the optical spectra of silicon nanoparticles

被引：6

作者：

Zhu, Y ^{[1
]}

Kimura, K

Zhang, LD

机构：

[1] Acad Sinica, Inst Solid State Phys, Hefei 230031, Peoples R China

[2] Himeji Inst Technol, Dept Mat Sci, Hyogo 67812, Japan

来源：

SOLID STATE COMMUNICATIONS | 1998年 / 108卷 / 08期

关键词：

semiconductors; nanofabrications; electron-phonon interactions; optical properties; light absorption and reflection;

D O I：

10.1016/S0038-1098(98)00405-0

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

A fine structure was observed in the UV/visible spectral region of silicon nanoparticles dispersed in a-propanol. The fine structure is sensitive to oxygen content in the shell of silicon particles. The results suggest that the fine structure arise from the localized Si-O-Si stretching vibration that can be coupled with the electron transition in the silicon and these localized states are caused by defects and dangling bonds neighboring Si-O-Si bonds. The defects and dangling bonds can disappear by introducing a large amount of oxygen gas into the sample. (C) 1998 Elsevier Science Ltd. All rights reserved.

引用

页码：545 / 548

页数：4

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