0.6-eV bandgap In0.69Ga0.31As thermophotovoltaic devices grown on InAsyP1-y step-graded buffers by molecular beam epitaxy

被引:29
作者
Hudait, MK [1 ]
Lin, Y
Palmisiano, MN
Ringel, SA
机构
[1] Ohio State Univ, Dept Elect Engn, Columbus, OH 43210 USA
[2] Bechtel Bettis Inc, W Mifflin, PA 15122 USA
关键词
InAsP; InGaAs; lattice-mismatch; MBE; TPV;
D O I
10.1109/LED.2003.816591
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Single-junction, lattice-mismatched (LMM) In0.69Ga0.31As thermophotovoltaic (TPV) devices with bandgaps of 0.60 eV were grown on InP substrates by solid-source molecular beam epitaxy (MBE). Step-graded InAsy P1-y buffer layers with a total thickness of 1.6 mum were,used to mitigate the effects of 1.1% lattice mismatch between the device layer and the InP substrate. High-performance single-junction devices were achieved, With an open-circuit voltage of 0.357 V and a fill factor of 68.1% measured at a short-circuit current density of 1.18 A/cm(2) under high-intensity, low emissivity white light illumination. Device performance uniformity was outstanding, measuring to better than 1.0% across. a 2-in diameter InP wafer indicating the promise of MBE growth for large area TPV device arrays.
引用
收藏
页码:538 / 540
页数:3
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