A high-performance complementary inverter based on transition metal dichalcogenide field-effect transistors

被引:63
作者
Cho, Ah-Jin [1 ,2 ]
Park, Kee Chan [3 ]
Kwon, Jang-Yeon [1 ,2 ]
机构
[1] Yonsei Univ, Sch Integrated Technol, Inchon 406840, South Korea
[2] Yonsei Inst Convergence Technol, Inchon 406840, South Korea
[3] Konkuk Univ, Dept Elect Engn, Seoul 143701, South Korea
来源
NANOSCALE RESEARCH LETTERS | 2015年 / 10卷
关键词
Transition metal dichalcogenide (TMD); CMOS inverter; 2-Dimensional material;
D O I
10.1186/s11671-015-0827-1
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
For several years, graphene has been the focus of much attention due to its peculiar characteristics, and it is now considered to be a representative 2-dimensional (2D) material. Even though many research groups have studied on the graphene, its intrinsic nature of a zero band-gap, limits its use in practical applications, particularly in logic circuits. Recently, transition metal dichalcogenides (TMDs), which are another type of 2D material, have drawn attention due to the advantage of having a sizable band-gap and a high mobility. Here, we report on the design of a complementary inverter, one of the most basic logic elements, which is based on a MoS2 n-type transistor and a WSe2 p-type transistor. The advantages provided by the complementary metal-oxide-semiconductor (CMOS) configuration and the high-performance TMD channels allow us to fabricate a TMD complementary inverter that has a high-gain of 13.7. This work demonstrates the operation of the MoS2 n-FET and WSe2 p-FET on the same substrate, and the electrical performance of the CMOS inverter, which is based on a different driving current, is also measured.
引用
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页数:6
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