Electron microscopy studies of thin Mo films grown by MBE on (100) SrTiO3 substrates

被引:6
|
作者
Tchernychova, E [1 ]
Scheu, C [1 ]
Wagner, T [1 ]
Fu, Q [1 ]
Rühle, M [1 ]
机构
[1] Max Planck Inst Met Res, Dept Ruehle, D-70569 Stuttgart, Germany
关键词
electron microscopy; metallic films; molybdenum; epitaxy; grain boundaries;
D O I
10.1016/S0039-6028(03)00996-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A highly mismatched Mo/SrTiO3 system was found to develop two non-equivalent orientation relationships between the metal film and the ceramic substrate. The molybdenum films, with a nominal thickness of 50 nm, were deposited by molecular beam epitaxy at T-substrate = 600 degreesC. The film and the substrate were investigated by X-ray diffraction, conventional and high-resolution transmission electron microscopy. The following orientation relationships (OR) were determined: OR I {1 1 0} Mo\\{1 0 0}STO; <1 0 0>Mo\\<1 0 0>STO, <1 1 0>Mo\\<1 0 0>STO, OR II {1 1 0}Mo\\{1 0 0}STO; <1 1 1>Mo\\<1 1 0>STO. The interfaces between the different Mo domains and the substrate were examined by high-resolution transmission electron microscopy. All interfaces were found to be abrupt; no significant reaction layer was directly observed. The grain boundaries between the domain variants are special tilt grain boundaries, as determined by high-resolution transmission electron microscopy. Some of the grain boundaries possess a low-energy configuration. The formation of the preferred orientation relationships, the interface features and the possible growth behaviour will be discussed. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:33 / 44
页数:12
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