Introduction of a die-to-database verification tool for the entire printed geometry of a die - Geometry verification system NGR2100 for DFM

被引：4

作者：

Kitamura, T ^{[1
]}

Kubota, K ^{[1
]}

Hasebe, T ^{[1
]}

Sakai, F ^{[1
]}

Nakazawa, S ^{[1
]}

Vohra, N ^{[1
]}

Yamamoto, M ^{[1
]}

Inoue, M ^{[1
]}

机构：

[1] NanGeometry Res Inc, Takatsu Ku, Kawasaki, Kanagawa 2130012, Japan

来源：

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XII, PTS 1 AND 2 | 2005年 / 5853卷

关键词：

entire die; image; geometry; target CAD data; verification; DFM;

D O I：

10.1117/12.620389

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The Geometry Verification System NGR2100 enables verification of the entire die, on a resist or an after-etch wafer, by comparing imacres of a die with corresponding target CAD data. The system detects systematic defects by variable criteria setting for allowable deformation quantities and obtains a CD distribution diagram. The result of systematic defects can then be used to make root cause analysis. The CD distribution diagram can achieve stepper aberration analysis, process windows extraction, macro-loading effect analysis, FEM measurement, and trend analysis more efficiently. Consequently, the Geometry Verification System NGR2100 will contribute to quicker TAT for DFM in Design, Lithography and Mask production.

引用

页码：988 / 999

页数：12