Defect evolution in ultrathin films of polystyrene-block-polymethylmethacrylate diblock copolymers observed by atomic force microscopy

被引：93
作者：
Hahm, J
Lopes, WA
Jaeger, HM
Sibener, SJ
机构：
[1] Univ Chicago, James Franck Inst, Dept Chem, Chicago, IL 60637 USA
[2] Univ Chicago, James Franck Inst, Dept Phys, Chicago, IL 60637 USA
来源：
JOURNAL OF CHEMICAL PHYSICS | 1998年 / 109卷 / 23期
关键词：
D O I：
10.1063/1.477702
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We track individual defects in the microdomain patterns of cylinder-forming polystyrene-block-polymethylmethacrylate films with atomic force microscopy to elucidate the evolution of diblock domain topology during annealing. This evolution takes place through relinking, joining, clustering, and annihilation of defects. Such processes form the basis for predicting structural change in polymer films. (C) 1998 American Institute of Physics. [S0021-9606(98)71047-5].
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页码：10111 / 10114
页数：4
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